JPH0425222Y2 - - Google Patents

Info

Publication number
JPH0425222Y2
JPH0425222Y2 JP11645685U JP11645685U JPH0425222Y2 JP H0425222 Y2 JPH0425222 Y2 JP H0425222Y2 JP 11645685 U JP11645685 U JP 11645685U JP 11645685 U JP11645685 U JP 11645685U JP H0425222 Y2 JPH0425222 Y2 JP H0425222Y2
Authority
JP
Japan
Prior art keywords
plasma generation
plasma
tube
furnace
microwave
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired
Application number
JP11645685U
Other languages
English (en)
Japanese (ja)
Other versions
JPS6228838U (en]
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed filed Critical
Priority to JP11645685U priority Critical patent/JPH0425222Y2/ja
Publication of JPS6228838U publication Critical patent/JPS6228838U/ja
Application granted granted Critical
Publication of JPH0425222Y2 publication Critical patent/JPH0425222Y2/ja
Expired legal-status Critical Current

Links

Landscapes

  • Treatments Of Macromolecular Shaped Articles (AREA)
  • Physical Or Chemical Processes And Apparatus (AREA)
  • Chemical Vapour Deposition (AREA)
  • ing And Chemical Polishing (AREA)
  • Drying Of Semiconductors (AREA)
JP11645685U 1985-07-31 1985-07-31 Expired JPH0425222Y2 (en])

Priority Applications (1)

Application Number Priority Date Filing Date Title
JP11645685U JPH0425222Y2 (en]) 1985-07-31 1985-07-31

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP11645685U JPH0425222Y2 (en]) 1985-07-31 1985-07-31

Publications (2)

Publication Number Publication Date
JPS6228838U JPS6228838U (en]) 1987-02-21
JPH0425222Y2 true JPH0425222Y2 (en]) 1992-06-16

Family

ID=31001061

Family Applications (1)

Application Number Title Priority Date Filing Date
JP11645685U Expired JPH0425222Y2 (en]) 1985-07-31 1985-07-31

Country Status (1)

Country Link
JP (1) JPH0425222Y2 (en])

Families Citing this family (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7183514B2 (en) * 2003-01-30 2007-02-27 Axcelis Technologies, Inc. Helix coupled remote plasma source
WO2012165921A1 (ko) 2011-06-03 2012-12-06 한국기초과학자원연구원 의료용 플라즈마 멸균장치

Also Published As

Publication number Publication date
JPS6228838U (en]) 1987-02-21

Similar Documents

Publication Publication Date Title
US11887819B2 (en) Systems for cooling RF heated chamber components
JP3050124B2 (ja) プラズマ処理装置
JPH0425222Y2 (en])
JP2003174016A (ja) 真空処理装置
JP2644758B2 (ja) レジスト除去方法及び装置
JP4999441B2 (ja) プラズマ処理装置
JP2978991B2 (ja) ケミカルドライエッチング装置
CN118431061A (zh) 一种用于半导体腔体自清洁的远程等离子设备
JP2574899B2 (ja) プラズマエッチング装置
JPH0441172Y2 (en])
CN113410113B (zh) 一种等离子体处理装置
JPS61131450A (ja) ドライエツチング装置
JPH0426194A (ja) 電子回路の放熱装置
JPH0775198B2 (ja) マイクロ波処理装置
JP3042300B2 (ja) プラズマ処理装置
JPH0323303Y2 (en])
JPS6116502B2 (en])
JPH04127426A (ja) プラズマエッチング装置
JP3966618B2 (ja) プラズマ処理装置
JP3277476B2 (ja) マイクロ波プラズマ処理装置のクリーニング方法
JPS6019139B2 (ja) エツチング方法およびプラズマエツチング用混合物ガス
JPS61267296A (ja) 減圧式マイクロ波乾燥装置
JPS6213579A (ja) 反応性イオンエッチング方法
JPH11162937A (ja) プラズマ処理装置
JPH02220437A (ja) アッシング装置